DFB (Distributed Feedback) and DBR (Distributed Bragg Reflector) lasers are advanced laser technologies with diverse applications in fields like telecommunications, sensing, and spectroscopy. DFB lasers utilize a periodic grating structure within the laser cavity, which easily can be build with Eulitha’s Lithography technology, allowing for stable single-frequency output. They are commonly used in high-speed optical data transmission and precise sensing applications. DBR lasers, on the other hand, employ a reflective grating structure, created by our lithography technology to generate a narrow wavelength range and high output power. They find use in telecommunications systems, fiber optic sensors, and spectroscopic analysis. DFB/DBR lasers offer exceptional performance, reliability, and versatility, making them crucial components for a wide range of optical applications.

VCSEL (Vertical-Cavity Surface-Emitting Laser) Polarizer Gratings, which Eulitha’s lithography technology enables, are specialized optical components that enable the control and manipulation of polarized light in VCSEL devices. These gratings consist of subwavelength periodic structures that selectively transmit or reflect light based on its polarization state. By incorporating VCSEL Polarizer Gratings, the polarization properties of emitted light can be precisely engineered, enhancing the performance and efficiency of VCSEL-based systems. These gratings find applications in optical communication, sensing, and imaging technologies, where the control of polarized light is critical. VCSEL Polarizer Gratings offer a compact and integrated solution for managing polarization, allowing for improved signal quality, increased data rates, and enhanced overall system performance.

Photonic Crystal Surface Emitting Lasers (PCSELs) are an innovative approach to light emission, utilizing photonic crystal structures to manipulate the behavior of light. PCSELs operate by embedding a light-emitting active layer in a photonic crystal gratings, resulting in a device that emits light perpendicular to the surface. This design offers several benefits over traditional edge-emitting lasers, such as greater energy efficiency, ability to fabricate large arrays, and beam steering without physical movement. PCSELs are also characterized by their single-mode operation, low threshold current, and high-speed modulation capability, making them ideal for high-speed data communication and other advanced photonic applications.

Significant research is being dedicated to semiconductor nanowires due to their potential in advanced electronic and optoelectronic devices, including energy-efficient, high-brightness nanowire-based LEDs. These nanowires are cultivated on patterned templates, specifically on nanoscale holes etched into a dielectric film on a growth substrate like GaN. These holes, typically about 100nm in diameter, serve as the starting points for vertical nanowire growth.

A high-precision lithographic method is needed to accurately and consistently print these hole arrays on growth substrates. While nanoimprint and e-beam lithography can be utilized, they have limitations in terms of speed, cost, and reliability. PHABLE technology offers a solution with its capacity to create required periodic structures uniformly and consistently. It can produce holes of about 100nm in diameter, regardless of pitch, accommodating both dense and sparse hole arrays. Eulitha's DUV PHABLE systems offer the needed resolution for this application.

Eulitha's PHABLE photolithography technology is a perfect solution for patterning sapphire substrates, a critical component in LED manufacturing. These patterned sapphire substrates (PSS) and Nano-Patterned Sapphire Substrates (NPSS) enhance the growth of high-quality semiconductor layers, boosting LED performance and light extraction efficiency. Traditional lithography technologies struggle to form high-resolution, uniform, and reproducible structures on sapphire substrates due to their poor surface flatness, often leading to high costs and low yields. However, PHABLE technology overcomes these hurdles, enabling full-field exposures to create seamless patterns with high yields and throughput, which can then be etched effortlessly into the sapphire substrates.