Exciting news! Our CEO Dr. Harun Solak will give a technical presentation about our revolutionary Displacement Talbolt Lithography (DTL) technology at the 27th lithography workshop in Sun Valley, Idaho USA.

In the picturesque setting of Sun Valley, Idaho, the 27th Lithography Workshop unfolded in the USA. Nestled amidst the breathtaking natural beauty of the Rocky Mountains, this esteemed gathering brought together industry leaders, researchers, and experts in the field of lithography. Against the backdrop of serene landscapes, attendees engaged in stimulating discussions, presentations, and workshops, exploring the forefront of lithography advancements and emerging technologies. From exploring the latest innovations in optical lithography and computational lithography to delving into novel approaches like EUV lithography and nanoimprint lithography, the workshop offered a platform for participants to share their expertise, exchange ideas, and foster collaborations. Amidst the camaraderie and inspiration that permeated the workshop, attendees left with a deeper understanding of the challenges and opportunities in lithography, as well as a renewed sense of enthusiasm for pushing the boundaries of this critical technology.