The company's lithography service business provides cutting-edge solutions for patterning structures at the nanoscale. They employ state-of-the-art technologies such as electron beam lithography (EBL) and laser interference lithography (LIL) to achieve exceptional precision and resolution in the fabrication of nanostructures. Eulitha's lithography services cater to a wide range of applications including semiconductors, optics, biomedical devices, and more.
What sets Eulitha apart is their expertise and commitment to customer satisfaction. They work closely with their clients to understand their specific needs and deliver tailored solutions. The company's team of experienced engineers and scientists ensure the highest quality standards are met, providing customers with reliable and reproducible results.
Furthermore, Eulitha AG's lithography services offer scalability, enabling production from small-scale prototyping to large-scale manufacturing. Their advanced lithography tools and processes ensure efficient and cost-effective production of complex nanostructures.
In summary, Eulitha AG's lithography service businesscombines the company’s PHABLE™ cutting-edge lithography technologies, expertise, and a customer-centric approach to deliver high-resolution lithography solutions for various applications in the photonics industries. Their commitment to innovation and excellence positions them as a trusted partner for businesses seeking advanced patterning solutions at the nanoscale.
Eulitha utilizes its advanced PHABLE and DTL lithography technologies to efficiently validate new prototypes and applications in nanofabrication.
Eulitha's Application Validation, also known as Demolab, harnesses the power of their advanced PHABLE and DTL lithography technologies to expedite the validation process for new prototypes and applications in nanofabrication. Leveraging these cutting-edge lithography technologies, Eulitha enables efficient and precise validation of various applications, ensuring optimal performance and functionality. By utilizing the capabilities of PHABLE and DTL, Demolab empowers researchers, engineers, and innovators to accelerate the development of nanofabrication projects and swiftly validate their viability. This streamlined approach provides a robust platform for exploring and validating novel applications, pushing the boundaries of nanofabrication and fostering technological advancements.
Eulitha offers Ebeam patterning services to academic and industrial customers for either direct use in experiments and devices or for production of replication templates.
Typical production cycle involves the following steps:
EULITHA has developed an efficient process for fabricating unique nanohole and pillar arrays over areas that were considered too large to be affordable until now.
Nanoholes formed with the newly developed process are etched into silicon substrates up to an aspect ratio (depth/diameter ratio) of 3. The period of the nanohole patterns is freely adjustable to anywhere between 70 nm to tens of microns. Nanopillars can have pitch down to 100 nm and height up to 200nm. Fields of application for the new nano arrays include patterned epitaxial growth substrates, magnetic nanostructures, nanoparticle production, biology, molecular self assembly and nanoimprint processes.
Eulitha AG excels in both high-volume and low-volume production, including situations where a smaller quantity of products or components needs to be manufactured using photolithographic processes. Low-volume series require adjustments to accommodate the smaller production scale, such as equipment setup, process parameters, and workflow changes. The focus shifts towards flexibility, customization, and faster turnaround times. Despite the challenges of maintaining process control and consistent quality, Eulitha AG effectively manages costs and optimizes resource utilization for limited production runs. Their expertise lies in adapting manufacturing processes to efficiently produce smaller quantities of components while meeting specific requirements.
