The PhableR tool provides unprecedented ability toprint high resolution periodic structures in a low-cost photolithography system. It is similar to a conventional mask-aligner where a photoresist coated wafer is put in proximity to a mask and exposed by a beam of UV light, but thanks to the breakthrough PHABLE exposure technology of Eulitha the resolution is no longer limited by undesired diffraction effects. Structures such as sub-micron period linear gratings and 2D patterns such as hexagonal and square lattices are printed with high uniformity and fidelity.

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The applications are almost unlimited including:

• Academic
• Optoelectronics
• Optical Components
• XR (AR/VR/MR)
• Bio/Medical
• Color/Visual Effect
• Litho Services

PhableR, developed by Eultiha AG, is an advanced photolithography tool designed to meet the needs of various applications. This introductory platform offers manual operation and features overlay alignment capabilities, making it suitable for wafer sizes ranging from 100mm to 200mm. Depending on the resolution requirements, PhableR is available with different light sources. It is highly customizable to accommodate the often non-standard requirements of photonic applications. With PhableR, high-volume printing of periodic patterns becomes seamless, thanks to its non-contact feature that protects masks and substrates from damage and contamination. The system delivers exceptional uniformity and reproducibility in printing, supporting both 1D and 2D periodic pattern printing. It is also suitable for non-flat and thin glass substrates. With impressive high-resolution options of 60nm or 125nm (minimum half pitch for UV and DUV versions), PhableR ensures precise printing and overlay alignment. The tool is compatible with commercially available masks and photoresists, offering flexibility and ease of use. PhableR further reduces production costs and maintenance requirements, making it a cost-effective choice for photolithography applications. Eultiha AG provides comprehensive application support, including photoresists and masks, to further enhance the user experience.