PhableS is a step-and-repeat lithography tool. It provides the ability to print high resolution periodic structures on wafer sizes up to 300mm in a low cost photolithography system. In addition, the tool's variable field size feature enables selective printing on multiple device masks. With automatic wafer and mask handling in a particle controlled mini- environment. the tool is suitable for high volume industrial production. Eulitha's breakthrough Displacement Talbot Lithography (DTL) technology enables high resolution printing near the wavelength limit in a non-contact configuration. Structures such as sub-micron period linear gratings and 2D patterns such as hexagonal and square gratings are printed with high uniformity and fidelity. The technique shares the same material and process solutions with photolithography methods that have been successfully used for semiconductor lithography for many decades.

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The applications are almost unlimited including:

• XR (AR/VR/MR)
• Optoelectronics
• Optical Components
• Bio/Medical
• Color/Visual Effect

PhableS, developed by Eultiha AG, is an introductory, manually operated photolithography tool designed for high-volume printing of periodic patterns. This versatile platform offers overlay alignment capabilities and supports wafer sizes between 100mm to 200mm. PhableS can be equipped with different light sources, allowing for flexibility based on the resolution requirements of the specific application. The tool also offers custom configurations to accommodate the often non-standard requirements of photonic applications. Some notable features of PhableS include step & repeat functionality for full area patterning of 200mm and 300mm wafers, non-contact operation to protect masks and substrates from damage and contamination, and cassette-to-cassette automatic wafer processing for efficient handling. The tool provides a large adjustable exposure field of up to 140mm x 140mm, ensuring highly uniform and reproducible printing. It supports both 1D and 2D periodic pattern printing with a resolution of 60nm half pitch. With automatic overlay alignment capability, PhableS simplifies the alignment process. It is suitable for non-flat and thin glass substrates and offers a mini environment for defect control. Additionally, the tool can be customized to meet specific requirements. PhableS features an integrated Post Exposure Bake (PEB) module as an optional feature and is designed for low maintenance and operation costs, making it a cost-effective solution for photolithography needs.