products & services
Standard Patterns
Eulitha specializes in the manufacturing of nanostructures with the most advanced lithography methods that include our unique PHABLE technology and electron beam lithography. The PHABLE technology enables coverage of large areas with photonic nanostructures. We offer a standard line of 1D and 2D periodic nanostructures products made with PHABLE and e-beam lithography. These patterns can be used as Nanoimprint Templates or directly in other research and development projects.
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Standard Phable™ -made Nanoimprint Templates.

Eulitha’s photonic templates are made with its revolutionary PHABLE™ technology, which guarantees highest quality at an affordable price. Optimized silicon and quartz etching yields hole and pillar patterns with a slight positive slope that facilitates the imprint process. Standard templates with square and hexagonal lattices as well as linear gratings are available.

The applications are almost unlimited including:

  • LED Light extraction layers
  • Templates for crystal growth
  • Nanoimprint process development
  • Sensor arrays
  • Nanoparticle production

PHABLE™ made Standard Patterns:

  • Photonic templates are provided on 4” Silicon or Fused Silica substrates as standard
  • Dicing to smaller substrate size or other substrate sizes are available upon request
  • Feature (hole or pillar) diameter is about half of the pattern pitch
  • Please inquire, if other duty-cycles, e.g. small pillars or holes are required.
  • Templates are manufactured upon order according to the feature height requested by the customer
  • Inquire for different feature heights that exceed the maximum indicated in the product tables
  • In most cases these standard patterns can be produced on customer’s own wafers, e.g. as photoresist patterns on GaN or sapphire wafers.
  • Anti-adhesion coating as well as dicing is available as an option on all NIL stamps
  • Nickel molds can be done from Si molds as a copy
  • Injection moulding mould inserts can be done using a nickel mold and a special fabrication process
Multi-Resolution Linear Grating Combinations DATA SHEET
Multi-Lattice Multi-Resolution Combination Mold DATA SHEET
Linear patterns DATA SHEET
Holes on Hexagonal Lattice DATA SHEET
Holes on Square Lattice DATA SHEET
Pillars on Hexagonal Lattice DATA SHEET
Pillars on Square Lattice DATA SHEET
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Standard Gold Plasmonic Structures.

Eulitha offers a new line of nano-structured products for use in the field of plasmonic research. The first products introduced in this category are arrays of Au dots and linear gratings formed on fused silica substrates.

  • Large area
  • Innovative Phable method
  • Quartz substrate
  • Pillar arrays with periods 600nm  and 1000nm
  • Linear gratings with period 500nm

Measurement

Spectrometric transmission measurements of the 600nm period Au dot-array show a clear resonance at a wavelength of about 550 nm.

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Nano & Micro V-Grooves by Anisotropic Etching of Silicon.

Anisotropic wet-etching of Si is a well-known micro- or nano-fabrication technique for obtaining smooth and precise geometrical shapes in the material. The process, however, requires considerable know-how which often discourages researchers from taking advantage of this unique possibility. Eulitha has combined its experience in the fabrication of periodic patterns with its wet etching expertise to offer standard and customized solutions. You can select either a standard item from the following list or contact us with your requirements for a custom-made solution.

SEM image of a 1.3um period v-groove pattern in silicon
High resolution linear grating - 140nm period
Hexagonal array - 600nm pitch
SEM image of a 600nm-period hexagonal array of Au discs
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